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Corial Plasma Therm – Corial 210D ICP-CVD system
The Corial 210D ICP-CVD system is ideal for R&D centers, and offers a wide range of applications for the specialty semiconductor markets….
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Corial Plasma Therm – Corial D250L PECVD system
The Corial D250L PECVD tool is designed for low volume production over a wide range of applications for specialty semiconductor markets…..
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Corial Plasma Therm – Corial D350 PECVD system
The Corial D350 PECVD system is designed to produce high-quality, uniform films for photonics, optoelectronics, and MEMS device manufacturing….
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Corial Plasma Therm – Corial D350L PECVD system
The Corial D350L PECVD system is designed to produce high-quality, uniform films for photonics, optoelectronics & MEMS devices manufacturing….
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Corial Plasma Therm – Corial D500 PECVD system
The Corial D500 PECVD system is designed to produce high quality, uniform films for power semiconductor devices, optoelectronics, and MEMS device manufacturing….
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PLASMA THERM – KOBUS
Plasma-Therm’s KOBUS product line offers a dedicated solution for single wafer deposition utilizing F.A.S.T. and PECVD technologies for both R&D and production customers…..
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PLASMA THERM – Takachi Series
The Takachi Series provides etching capabilities over a variety of materials and substrates. The small footprint, low cost, ease of use and superior performance make…
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PLASMA THERM- LAPECVD™
Plasma-Therm’s LAPECVD™ (Large Area Plasma Enhanced Chemical Vapor Deposition) uses a cassette-to-cassette configuration to allow for high-volume production in a wide range of applications…..
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PLASMA THERM- QuaZar™ Systems
The systems use best-in-class software, components, electrical and mechanical design. The result is a platform that can be rapidly configured for a wide range of applications. The tools are qualified and in volume production in 200 mm fabs…..
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PLASMA THERM- VERSALINE® HDPCVD
Plasma-Therm’s VERSALINE HDPCVD product is a new approach to achieving highly dense and conformal films at low substrate temperatures……
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