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Corial Plasma Therm – Corial D250L PECVD system
The Corial D250L PECVD tool is designed for low volume production over a wide range of applications for specialty semiconductor markets…..
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Corial Plasma Therm – Corial D350 PECVD system
The Corial D350 PECVD system is designed to produce high-quality, uniform films for photonics, optoelectronics, and MEMS device manufacturing….
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Corial Plasma Therm – Corial D350L PECVD system
The Corial D350L PECVD system is designed to produce high-quality, uniform films for photonics, optoelectronics & MEMS devices manufacturing….
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Corial Plasma Therm – Corial D500 PECVD system
The Corial D500 PECVD system is designed to produce high quality, uniform films for power semiconductor devices, optoelectronics, and MEMS device manufacturing….
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PLASMA THERM – KOBUS
Plasma-Therm’s KOBUS product line offers a dedicated solution for single wafer deposition utilizing F.A.S.T. and PECVD technologies for both R&D and production customers…..
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PLASMA THERM- LAPECVD™
Plasma-Therm’s LAPECVD™ (Large Area Plasma Enhanced Chemical Vapor Deposition) uses a cassette-to-cassette configuration to allow for high-volume production in a wide range of applications…..
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PLASMA THERM- VERSALINE® PECVD
Plasma-Therm’s VERSALINE PECVD is the result of decades of technological innovation. VERSALINE PECVD systems can deposit many different high-quality films, delivering maximum productivity with….
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PLASMA THERM- Vision 310 PECVD
The Vision 310 PECVD is a fundamental deposition system for semiconductor fabrication and material science facilities. Used in R&D and low volume production applications, the classic….
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PLASMA THERM- Vision 410 PECVD
The Vision 410 PECVD is a film deposition system for R&D, open load production for semiconductor fabrication and material science research. The small footprint, low cost, ease of use and….
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