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Corial Plasma Therm – Corial 200FA RIE Etch system
The Corial 200FA combines the advantages of high rates with low cost of ownership for IC failure analysis applications….
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Corial Plasma Therm – Corial 200S RIE etch system
This simple-to-use, manually-loaded RIE system can etch a wide range of materials including silicon, silicon-based compounds, metals, and polymers with fluorinated gases….
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Corial Plasma Therm – Corial 210RL RIE etch system
The Corial 210RL offers a flexible solution for reactive ion etching of wafer pieces, or up to full 200 mm wafers….
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Corial Plasma Therm – Corial 300S RIE etch system
With chrome and quartz etch capabilities, the Corial 300S RIE system is ideal for mask repair. This product can process….
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Corial Plasma Therm – Corial 360RL RIE etch system
With chrome and quartz etch capabilities, the Corial 360RL RIE system is ideally suited for mask repair. This product can….
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PLASMA THERM- VERSALINE® RIE
Plasma-Therm’s VERSALINE RIE systems are installed in a wide range of production capacity facilities – from R&D through high-volume production. VERSALINE RIE offers low….
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PLASMA THERM- Vision 320 RIE
The Vision 320 RIE provides etch capability for R&D, prototyping, and low volume production. This parallel-plate capacitance based systems is found in applications that include fundamental material studies, surface modification, semiconductor device fabrication, and failure analysis involving delayering….
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PLASMA THERM- Vision 420 RIE
The Vision 420 RIE provides etching capabilities over a variety of materials and substrates for non-caustic etching (primarily Fluorine based). The small footprint, low cost, ease of use and superior performance makes the Vision 420 an ideal candidate for a wide range of uniform, high quality films serving R&D….
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