Logo - Eden Lab

PLASMA THERM – Takachi Series

[vc_row][vc_column][vc_column_text]The Takachi Series provides etching capabilities over a variety of materials and substrates. The small footprint, low cost, ease of use and superior performance make the Takachi Series ideal for a wide range of uniform, high quality ICP etch applications serving R&D, FA, prototyping, pilot line and low volume production. The Takachi Series is ideal for numerous technologies such as Failure/Yield Analysis, Photonics, Solid State Lighting, MEMs, and Wireless ICP etch processing.

The Takachi Series provides technology for etch using a high density ICP source with a RF biased lower electrode:

Takachi ICP (Inductively Coupled Plasma)

Handling

The Takachi system utilizes a load lock with manual loading incorporating Plasma-Therm’s highly regarded Shuttlelock® system in a compact, robust and easily maintained form factor.

Productivity Enhancements

  • Process Library: Uses well-established reactor technology that provides reliable performance and is supported with guidance from a continuously evolving process library.
  • Endpoint: Both laser and optical emission spectroscopy endpoint technologies are available to augment processing capability.
  • Data Logging: Simplified data collection for sharing of process monitoring and recipe information.

[/vc_column_text][/vc_column][/vc_row]

Why Choose Eden Lab

Australian Company
Top Support
Full Spectrum of Products
Years of Experience

Fast Shipping

Ready to Ship Freeze Dryers

Top Support

Local Dedicated Support

Peace of Mind

Covered By Australian Law