PLASMA THERM- VERSALINE® RIE

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Plasma-Therm’s VERSALINE RIE systems are installed in a wide range of production capacity facilities – from R&D through high-volume production. VERSALINE RIE offers low….

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Plasma-Therm’s VERSALINE RIE systems are installed in a wide range of production capacity facilities – from R&D through high-volume production. VERSALINE RIE offers low maintenance and high versatility for multiple applications.

Substrate sizes are conveniently accommodated without ever needing hardware reconfiguration. For future upgradeability to ICP, a high conductance option is available.

Hardware

  • Simple, low-maintenance design
    – Flexible substrate bias options with 13.56 MHz and 40 MHz
  • Flexible and upgradeable handling
    – ML — direct manual loading (single or multi-substrate)
    – LL — single substrate or multi-substrate carrier loader
    – CX — cassette-to-cassette loading of wafers or carriers
  • Improved preventative maintenance cycles with thermally managed chamber liner and pump train
  • Digital MFCs with filtered and bypassed gas lines
  • Mag-Lev turbo pump
  • Efficient thermal management with monoblock electrode construction
  • Available substrate electrode temperature ranges –40ºC to 180ºC
  • Process specific electrode material

Endpoint

Integrated multifunctional endpoint capability with EndpointWorks

Laser Interferometry

  • OEI
  • OES
  • System Parameters
  • Custom inputs (e.g., RGA)

Software

  • User-friendly SEMI standard interface (E-95)
  • Comprehensive data logging
  • Automated cleaning program (AMS)
  • Real-time process data display
  • Fully integrated endpoint system
  • Factory automation compatible (SECS/GEM)
  • Edit recipes during runs
  • Multiple user access levels
  • Alarm history

Process

  • Tunable selectivity
  • Extensive process library
  • Wide process latitude
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