PLASMA THERM – Takachi Series
The Takachi Series provides etching capabilities over a variety of materials and substrates. The small footprint, low cost, ease of use and superior performance make…
The Takachi Series provides etching capabilities over a variety of materials and substrates. The small footprint, low cost, ease of use and superior performance make the Takachi Series ideal for a wide range of uniform, high quality ICP etch applications serving R&D, FA, prototyping, pilot line and low volume production. The Takachi Series is ideal for numerous technologies such as Failure/Yield Analysis, Photonics, Solid State Lighting, MEMs, and Wireless ICP etch processing.
The Takachi Series provides technology for etch using a high density ICP source with a RF biased lower electrode:
Takachi ICP (Inductively Coupled Plasma)
The Takachi system utilizes a load lock with manual loading incorporating Plasma-Therm’s highly regarded Shuttlelock® system in a compact, robust and easily maintained form factor.
- Process Library: Uses well-established reactor technology that provides reliable performance and is supported with guidance from a continuously evolving process library.
- Endpoint: Both laser and optical emission spectroscopy endpoint technologies are available to augment processing capability.
- Data Logging: Simplified data collection for sharing of process monitoring and recipe information.