The Gridless End-Hall Ion Sources have been specially developed to provide a cost effective solution for ion assisted vacuum processes from small to large sized deposition systems. The sources provide an extremely reliable and maintenance-free up to 3kW source for many applications in PVD processes.
The compact design and rugged construction allows easy installation to both new and existing vacuum deposition systems.
Features
- Ion beam energies up to 300eV
- Ion beam currents to 15 amps
- Full-time use of high purity oxygen, argon or nitrogen.
- Highly efficient design greatly reduces gas load
- Water-cooled to reduce maintenance and radiation load
- Extremely low maintenance. The patented design utilizes a specially coated anode, which resists build-up of electrically insulating oxide coatings. No routinely replacement parts.
- Extremely stable operation in IAD processes
- Broad – beam divergence for large area coverage with uniform ion flux.
- Pulse-mode operation for ion-assistance of radiation-sensitive film materials such as many commonly used infrared and UV thin film materials eg MgF2 & LaF2. For further information please refer to separate information sheets.
- Remote Control and Monitoring – all control through an RS232 interface
